M00002781
New product
TIA-526-4 Revision A, November 1, 1997 OFSTP-4 Optical Eye Pattern Measurement Procedure
In stock
Warning: Last items in stock!
Availability date: 09/09/2021
Description / Abstract:
This procedure describes a method of measuring the repetitive temporal
characteristics of a
two-level, intensity-modulated optical waveform (eye pattern) at an
optical interface point. From
the measured eye pattern, waveform parameters such as rise time, fall
time, overshoot, and
extinction ratio can be extracted. Alternatively, the waveform can be
tested for compliance with a
predetermined waveform mask. The primary components of the measurement
system are a photodetector,
a low-pass filter, and an oscilloscope, as shown in figure 1.
The bandwidth and other characteristics of the low-pass filter depend
on the application. Refer to
product-specific documentation for the specification of the low-pass
filter transfer function.